GATE 2018 EC – Question 30
There are two photolithography systems: one with light source of wavelength $\lambda_1=156$ nm (System 1) and another with light source of wavelength $\lambda_2=325$ nm (System 2). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using System1 and System2 are $L_{min1}$ and $L_{min2}$ respectively, the ratio $L_{min1}/L_{min2}$ (correct to two decimal places) is ________.
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Correct answer: 0.47 to 0.49
Explanation
The minimum feature size is proportional to the wavelength, so $\frac{L_{min1}}{L_{min2}}=\frac{156}{325}=0.48$.